Versatile FIB-SEM
ZEISS Crossbeam 550 combines powerful imaging and analytical SEM with superior processing ability of a focused ion beam (FIB).
ZEISS Crossbeam 550 combines powerful imaging and analytical SEM with superior processing ability of a focused ion beam (FIB).
ZEISS Crossbeam 550 allows simultaneous modification and monitoring of samples, resulting in fast sample preparation and high throughput, e.g., for cross-sectioning, TEM lamella and atom probe tip preparation, nano-patterning, and 3D tomography with analytics.
Good surface and material contrast of materials from materials to TEM thin biological sections.
This microscope has state-of-the-art EDS and EBSD detectors for chemical and crystallographic analysis.
ZEISS Crossbeam 550 FIB-SEM has widespread applications in metallurgy, ceramics, composites, polymers, geology, arts, biology, pharmaceuticals, forensics, and other disciplines.
General specifications | |
Scanning electron gun | |
SEM voltage | 0.02-30 kV |
SEM probe intensity | 10 pA – 40 nA |
SEM magnification | 12- 2,000,000 x |
SEM resolution | 1.6 nm at 1 kV |
Focused ion beam gun | |
FIB voltage | 30 kV |
FIB probe intensity | 1pA – 100nA |
FIB magnification | 300 – 500,000 x |
FIB resolution | 3 nm at 30 kV |
Detectors | |
In-Chamber Everhart Thornley SE2 | Surface contrast, long range |
In-Lens SE2 | Surface contrast, short range |
In-Lens ESB | Material contrast |
In-chamber retractable large-area diode-based BSD | Material contrast |
In-chamber retractable annular multi-mode aSTEM detector | High resolution, surface and material contrast |
Oxford Instrument Ultim Max EDS detector | High sensitivity and speed |
Oxford Instrument Ultim Extreme Windowless EDS detector | High spatial resolution, 1 to 7 kV |
Oxford Instrument Symmetry S2 EBSD CMOS detector | High sensitivity and indexing speed of > 4000 patterns per second (pps) |
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